METHOD AND APPARATUS OF REMOVING FOREIGN MATTERS DEPOSITED ON SURFACE

摘要

PROBLEM TO BE SOLVED: To provide a method and apparatus for removing foreign matters (such as resist) deposited on the surfaces of various sorts of products including an electronic device substrate such as a liquid crystal glass substrate and cleaning the surfaces efficiently in a short time. SOLUTION: The method can remove foreign matters deposited on the surface of an object 1, by applying an ozone-soluble solvent on the surface of the object 1 to form a solution film thereon, and introducing a gas containing a high concentration of ozone into a lamellar gap between the surface and a ceiling plate 14 or another object to contact the gas with the solution film.