Method for detecting removal of organic material from a semiconductor device in a manufacturing process

摘要

In a method for removing an organic material from a semiconductor device at least one semiconductor device (20) is inserted into a so-called piranha bath (40). Measurement data are processed to get a data curve (K2) when measuring a concentration of at least one reaction product. It is queried for at least one of a turning point (TP1), a local maximum point (MAX) or a local minimum point (MIN) of the curve each being significantly different from signal noise after removing the semiconductor device (20) from the fluid (40). With this information it is decided on further processing of the semiconductor device. The method is suitable for detecting incomplete removal of organic material, i.e. photoresist deposited on the processed semiconductor device.