发明名称 Cleaning method using an oxidizing agent, chelating agent and fluorine compound
摘要 The cleaning method described above is characterized by allowing a cleaning agent comprising an oxidizing agent, a chelating agent and fluorine compound to flow on a surface of a material to be treated at a high speed to thereby clean the above surface according to the present invention, deposits adhering firmly to a surface of a material to be treated can readily be removed without damaging the material to be treated.
申请公布号 US6514352(B2) 申请公布日期 2003.02.04
申请号 US20010971578 申请日期 2001.10.09
申请人 TOKYO ELECTRON LIMITED;MITSUBISHI GAS CHEMICAL COMPANY INC. 发明人 GOTOH HIDETO;NIUYA TAKAYUKI;MORI HIROYUKI;MATSUNAGA HIROSHI;ISHIHARA FUKUSABURO;KIMURA YOSHIYA;SOTOAKA RYUJI;GOTO TAKUYA;AOYAMA TETSUO;ABE KOJIRO
分类号 B08B3/08;B08B3/10;C03C23/00;C11D3/32;C11D3/36;C11D3/39;C11D3/43;C11D7/28;C11D7/30;C11D7/32;C11D7/36;C11D7/50;C11D7/54;C11D7/60;C11D11/00;H01L21/304;H01L21/311;(IPC1-7):C23G1/02 主分类号 B08B3/08
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