发明名称 |
Cleaning method using an oxidizing agent, chelating agent and fluorine compound |
摘要 |
The cleaning method described above is characterized by allowing a cleaning agent comprising an oxidizing agent, a chelating agent and fluorine compound to flow on a surface of a material to be treated at a high speed to thereby clean the above surface according to the present invention, deposits adhering firmly to a surface of a material to be treated can readily be removed without damaging the material to be treated.
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申请公布号 |
US6514352(B2) |
申请公布日期 |
2003.02.04 |
申请号 |
US20010971578 |
申请日期 |
2001.10.09 |
申请人 |
TOKYO ELECTRON LIMITED;MITSUBISHI GAS CHEMICAL COMPANY INC. |
发明人 |
GOTOH HIDETO;NIUYA TAKAYUKI;MORI HIROYUKI;MATSUNAGA HIROSHI;ISHIHARA FUKUSABURO;KIMURA YOSHIYA;SOTOAKA RYUJI;GOTO TAKUYA;AOYAMA TETSUO;ABE KOJIRO |
分类号 |
B08B3/08;B08B3/10;C03C23/00;C11D3/32;C11D3/36;C11D3/39;C11D3/43;C11D7/28;C11D7/30;C11D7/32;C11D7/36;C11D7/50;C11D7/54;C11D7/60;C11D11/00;H01L21/304;H01L21/311;(IPC1-7):C23G1/02 |
主分类号 |
B08B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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