| 摘要 |
PURPOSE: A coating substrate, an antireflective composition and a forming method of photoresist relief image using the composition are provided, to increase the storage lifetime of solutions of an antireflective composition in a protic medium. CONSTITUTION: The antireflective composition comprises an ionic thermal acid generator compound; and a resin. Preferably the ionic thermal acid generator compound is a sulfonate salt. The coating substrate comprises a layer comprising the antireflective composition; and a photoresist layer formed on the composition layer. Preferably the composition layer comprises further a crosslinker. The forming method comprises the steps of coating the antireflective composition on a substrate; coating a photoresist layer on the composition layer; and exposing and developing the photoresist layer to form a resist relief image.
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