| 摘要 |
The present invention is to provide a method for removing by-products, which cause to form a powder in gas exhaust line in CVD process of semiconductor and LCD manufacturing process and apparatus for carrying out the said method. The by-product is substantially undesired salts such as NH4C1, SiO2, or the mixture of NH4F and (NH4)2SiF6, and reactive gases to form these salt. The method of the invention is to supply the by-products as the form of bobble in the main chamber filled with solution and are removed by a chemical and physical treatment using cavitations effect of ultrasonic and liquid membrane effect. |
