| 摘要 |
PURPOSE: To provide a liquid crystal display device and a production method therefor, with which satisfactory display performance is presented even when a PR process is reduced. CONSTITUTION: In the production method for the liquid crystal display device having a thin film transistor and a reflection plate on an insulating substrate, an etching mask is formed on a metal layer formed on the insulating substrate, the constitutive part and projecting part of the thin film transistor are formed by etching the metal layer while using the etching mask, and the exposed faces of the constitutive part and projecting part of the thin film transistor or surface of the nearby insulating substrate is covered with the etching mask while exposing one part of the surface of the insulating substrate by the reflow of only the etching mask. Then, a recessed part is formed in the exposed area of the insulating substrate while using the etching mask, and the reflection plate is formed on the projecting part and the recessed part.
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