| 发明名称 |
Overlap design of one-turn coil |
| 摘要 |
A coil for inductively coupling RF energy to a plasma in a substrate processing chamber has adjacent spaced and overlapping ends to improve uniformity of processing of the substrate.
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| 申请公布号 |
US6506287(B1) |
申请公布日期 |
2003.01.14 |
| 申请号 |
US19980039695 |
申请日期 |
1998.03.16 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
DING PEIJUN |
| 分类号 |
H05H1/46;C23C14/34;H01J37/32;H01J37/34;H01L21/203;H01L21/285;(IPC1-7):C23C14/32 |
主分类号 |
H05H1/46 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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