| 摘要 |
PURPOSE: To provide a work stage of a resist setting device. CONSTITUTION: The work stage of the resist setting device which sets resist by holding a work coated with the resist on a work station through vacuum suction, irradiating the resist with ultraviolet rays while raising the temperature, and cooling it after the ultraviolet-ray irradiation is equipped with a heating means and a cooling means. The work stage is formed of aluminum alloy or copper alloy which satisfies σ/σy<=3.1 (where σ is thermal stress and found from σ=Eα ΔT, where E is a Young's modulus (N/mm¬2) at 200°C, α is a coefficient of linear expansion (1/°C) at 200°C, and ΔT is a temperature difference (°C)=120°C, and σy is a yield point at 200°C) Consequently, the work stage is prevented from curving large and the work can securely be held on the surface of the state through vacuum suction.
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