发明名称 SUBSTRATE-CLEANING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a small installation space substrate-cleaning apparatus, capable of being made small sized with easy maintenance of replacement, cleaning, and the like of its component and the like. SOLUTION: An upper stage cleaning unit 10 and a lower stage cleaning unit 50 are arranged in the upper and lower two stages, the upper stage cleaning unit 10 comprises a substrate-holding mechanism 11 and a driving mechanism 12, the lower stage cleaning unit 50 comprises a substrate-holding mechanism 52 and a driving mechanism 53, and the upper stage cleaning unit 10 can be flipped upward via a hinge 51.
申请公布号 JP2003007662(A) 申请公布日期 2003.01.10
申请号 JP20010187940 申请日期 2001.06.21
申请人 EBARA CORP 发明人 ISHIKAWA SEIJI
分类号 B25J9/06;B65G49/07;H01L21/304;H01L21/677;H01L21/68;(IPC1-7):H01L21/304 主分类号 B25J9/06
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