APPARATUS FOR SENSING PHOTORESIST BURNING AND METHOD USING THE SAME

摘要

PURPOSE: An apparatus for sensing photoresist burning is provided to detect whether the temperature of a wafer is changed by the heat generated by the combustion of the photoresist by including a chuck in which the wafer having the photoresist is settled and by installing a resistance detecting sensor in the chuck. CONSTITUTION: The wafer(114) on which the photoresist(116) is applied is settled in the chuck(108). The resistance detecting sensor(110) detects the electrical resistance caused by the temperature changer of the wafer, installed inside the chuck. A sensor control unit(104) flows a uniform quantity of current to the resistance detecting sensor at regular intervals of time and controls the operation of the resistance detecting sensor. An equipment control(100) unit stops an etch process if the resistance value detected by the resistance detecting sensor exceeds a predetermined resistance value.