METHOD FOR FABRICATING LOWER ELECTRODE OF CAPACITOR BY ELECTROPLATING METHOD

摘要

PURPOSE: A method for fabricating a lower electrode of capacitor by an electroplating method is provided to prevent devices from being short-circuited and an electrical characteristic from being deteriorated by easily eliminating the byproduct generated by forming the lower electrode of capacitor made of noble metal. CONSTITUTION: An etch barrier layer(23) and a lower electrode seed layer(24) are sequentially formed on a substrate(20). The lower electrode(26) is formed in a predetermined region on the seed layer by using an electroplating method. A sacrificial layer of a spacer type is formed on the sidewall of the lower electrode. The seed layer on a peripheral region of the lower electrode is eliminated. The sacrificial layer is removed.