| 摘要 |
PURPOSE: A method for fabricating a color filter of an image sensor is provided to improve transmissivity of incident light and to form a uniform color filter regardless of the topology of an underlying layer by making the color filter formed of an oxide layer. CONSTITUTION: A porous oxide layer is deposited on a substrate. A pigment ion implantation process is selectively performed on the porous oxide layer region where a color filter is to be formed. The porous oxide layer is deposited by an atmospheric pressure chemical vapor deposition(APCVD) method.
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