| 摘要 |
<p>PROBLEM TO BE SOLVED: To eliminate the propagation of microorganisms in a wet contaminated gas removing apparatus by a simple method. SOLUTION: This cleaning apparatus is provided with a spray chamber 7 in which a spray nozzle 4 is arranged, eliminators 12 arranged respectively in the upstream side and the downstream side of the spray chamber, a shutter arranged on the eliminator of the spray chamber side and a spray water vessel 5 for supplying pure water or hydrogen peroxide water to the spray nozzle, and removes contaminant by bringing air containing the contaminant into contact with the pure water. In the apparatus, at the time of cleaning the spray chamber, the shutter is closed and the hydrogen peroxide water is supplied to the spray nozzle 4.</p> |
