NICKEL CARBONYL VAPOUR DEPOSITION PROCESS

摘要

A closed loop, carbon monoxide self-contained continuous process for the production of nickel or nickel coated objects by the nickel vapour depositio n process, comprising placing an object to be treated with nickel carbonyl by said nick el vapour deposition process in a deposition chamber; feeding a gaseous mixture of nic kel carbonyl and carbon monoxide to said deposition chamber; depositing nickel on said ob ject to produce said nickel or nickel coated object in said chamber and a nickel car bonyl-depleted gaseous mixture; removing said nickel carbonyl-depleted gaseous mixture from said chamber; removing nickel carbonyl from said nickel carbonyl-depleted ga seous mixture to produce an essentially nickel carbonyl-free gas; feeding said ess entially nickel carbonyl-free gas to a nickel carbonyl reactor containing nickel powder to p roduce a fresh gaseous mixture comprising fresh nickel carbonyl and carbon monoxide; separa ting said fresh nickel carbonyl from said fresh gaseous mixture to produce a second ca rbonmonoxide containing gas; and recycling said second c arbon monoxide containing gas to said nickel carbonyl reactor. The process and apparatus provides a more econ omic to operate, safe and more operably reliable than prior art NVD processes.