发明名称 Design of gas injection for the electrode in a capacitively coupled RF plasma reactor
摘要 A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
申请公布号 US6502530(B1) 申请公布日期 2003.01.07
申请号 US20000559408 申请日期 2000.04.26
申请人 发明人
分类号 H05H1/46;B01J19/08;B01J19/24;C03C23/00;C23C16/44;C23C16/455;C23C16/50;C23C16/509;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C23C16/509 主分类号 H05H1/46
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