发明名称 Semiconductor device
摘要 A lateral MOSFET exhibiting a high breakdown voltage includes a plurality of unit devices formed in a semiconductor substrate; each unit device including a trench, the side face thereof being extended at any angle from 30 degrees to 90 degrees with respect to the surface of trench; an offset drain region surrounding the side face and the bottom face of trench; an insulator filling trench; a gate electrode extended onto trench such that gate electrode works as a field plate; a source electrode extended above trench such that source electrode works as a field plate; and a drain electrode extended above trench such that drain electrode works as a field plate.
申请公布号 US2003001202(A1) 申请公布日期 2003.01.02
申请号 US20020143732 申请日期 2002.05.10
申请人 KITAMURA AKIO 发明人 KITAMURA AKIO
分类号 H01L29/06;H01L29/10;H01L29/40;H01L29/423;H01L29/78;(IPC1-7):H01L29/76 主分类号 H01L29/06
代理机构 代理人
主权项
地址