发明名称 Method for improved line patterning by chemical diffusion
摘要 A method and articles of manufacture created from this method wherein a portion of a layer of photoresist material are irradiated to cause the creation of a chemical within that portion, and then the passage of time and/or the application of heat is used to cause the chemical to propagate to another portion of the layer of photoresist material.
申请公布号 US2003003408(A1) 申请公布日期 2003.01.02
申请号 US20010895352 申请日期 2001.06.29
申请人 LEE EVERETT;KAO SUSAN 发明人 LEE EVERETT;KAO SUSAN
分类号 G03F7/004;G03F7/38;(IPC1-7):G03F7/40 主分类号 G03F7/004
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