发明名称 |
METHOD AND ELECTRODE FOR DEFINING AND REPLICATING STRUCTURESIN CONDUCTING MATERIALS |
摘要 |
The present invention concerns an electrochemical pattern replication method , ECPR, and a construction of a conductive electrode for production of applications involving micro and nano structures. An etching or plating pattern, which is defined by a conductive electrode, a master electrode (8), is replicated on an electrically conductive material, a substrate (9). The master electrode (8) is put in close contact with the substrate (9) and the etching/plating pattern is directly transferred onto the substrate (9) b y using a contact etching/plating process. The contact etching/plating process is performed in local etching/plating cells (12, 14), that are formed in closed or open cavities between the master electrode (8) and the substrate ( 9).
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申请公布号 |
CA2462098(A1) |
申请公布日期 |
2002.12.27 |
申请号 |
CA20022462098 |
申请日期 |
2002.06.17 |
申请人 |
REPLISAURUS TECHNOLOGIES AB |
发明人 |
MOELLER, PATRIK;FREDENBERG, MIKAEL;WIVEN-NILSSON, PETER |
分类号 |
C25D5/22;C25D5/02;C25D7/00;C25D7/12;C25F3/14;H05K3/07;H05K3/20;(IPC1-7):C25D5/02;B81C1/00;C25F3/02 |
主分类号 |
C25D5/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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