| 摘要 |
PROBLEM TO BE SOLVED: To shorten a time required for purging with inert gas in a space (optical path space), such as a space between a projection optical system and a substrate, through which an exposure light passes. SOLUTION: This aligner is provided with a wafer stage 102, a projection optical system 102, and a shielding member 115 surrounding the side surfaces of an optical path space 113 between the stage 102 and the system 101. An exposure light passes through the path space 113. Distances between an end of the member 115 and a wafer 103 is large at the upstream side of the flow of a surrounding atmosphere and is small at the downstream side thereof. |
