| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma CVD apparatus which keeps an annular waveguide at low temperature. SOLUTION: The plasma CVD apparatus which supplies microwave electric power from an antenna 20 provided in an internal circumference of the annular waveguide 5, into a reaction chamber 2 arranged inside the waveguide 5, and generates plasma inside the above reaction chamber 2 to form a film by vapor- phase epitaxial synthesis method, is characterized by arranging a cooling device 27 between the above annular waveguide 5 and the reaction chamber 2. |
