| 发明名称 |
Use of membrane properties to reduce residual stress in an interlayer region |
| 摘要 |
A method and apparatus comprising thinning a substrate sufficiently to allow it to be mechanically compliant with a material deposited on its surface is disclosed. The mechanical compliance allows a reduction in the interlayer stress generated by dissimilarities in the materials.
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| 申请公布号 |
US6498086(B1) |
申请公布日期 |
2002.12.24 |
| 申请号 |
US20010917301 |
申请日期 |
2001.07.26 |
| 申请人 |
INTEL CORPORATION |
发明人 |
ZHENG DAWAI |
| 分类号 |
C23C14/00;C23C14/58;H01L21/20;H01L21/285;(IPC1-7):H01L21/20;H01L21/44 |
主分类号 |
C23C14/00 |
| 代理机构 |
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