| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin-film manufacturing device, capable of forming a thin film of oxide superconductor formed uniformly about the longitudinal direction of the base material and stretching longer than conventional by maintaining the temperature of that portion of base material, where the thin film is deposited (film-forming region) to a temperature range suitable for film formation over a long time. SOLUTION: The thin-film manufacturing device is configured, so that the base material 1 in tape shape is fed into a film-forming chamber 10a, capable of being evacuated and that the constituent particles of a target 12 installed in the chamber 10a are beaten out, while the base material 1 is heated and deposited on the base material 1 so as to form the thin film, where a heater 31 to heat the base material 1 is installed in the neighborhood of that region on the base material 1, where the thin film is formed and is equipped with a high-resistance heating element chiefly containing Pt, and on the surface of this high-resistance heating element, a protective layer is provided chiefly containing either Al2 O3 or SiO2 .
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