发明名称 METHOD FOR TREATING EXPOSED SILVER HALIDE EMULSION LAYER, HOLOGRAM MANUFACTURED BY THE METHOD AND HOLOGRAM OPTICAL ELEMENT CONTAINING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method for treating exposed silver halide emulsion layer, a hologram manufactured by the method and a hologram optical element containing the same. SOLUTION: This method for treating exposed silver halide emulsion layer comprises a step 40 of pre-hardening an exposed emulsion layer, a step 50 of developing the pre-hardened emulsion layer, a step 60 of bleaching the emulsion layer after development, a step 70 of subjecting the emulsion layer after the bleaching to the first hardening (the first curing), a step 80 of subjecting the emulsion layer after the first hardening to the first drying, a step 90 of subjecting the emulsion layer after the first drying to the second hardening (the second curing), a step 100 of subjecting the emulsion layer after the second hardening to fixing treatment, a step 110 of subjecting the silver halide emulsion layer which is subjected to the fixing treatment to hot water treatment and a step 120 of subjecting the silver halide emulsion layer which is subjected to hot water treatment to the second drying.
申请公布号 JP2002366013(A) 申请公布日期 2002.12.20
申请号 JP20020157708 申请日期 2002.05.30
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 KIM JONG-MAN
分类号 G03C5/08;G02B5/32;G03C1/00;G03C5/26;G03C5/29;G03C5/38;G03C5/44;G03C11/00;G03C11/08;G03C11/16;G03H1/00;G03H1/02;G03H1/04;G03H1/18;G03H5/00;(IPC1-7):G03H1/04 主分类号 G03C5/08
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