发明名称 |
MULTICOMPONENT THIN FILM AND ITS FORMATION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a multicomponent thin film and its formation method. SOLUTION: Although a unit substance layer for composing a thin film to be formed on a substrate is formed after the substrate is loaded into a reaction chamber, the unit substance layer is formed through a first stage that is formed by a mosaic atom layer composed of two types of precursors including a substance constituent for at least composing the thin film, a second stage for purging the inside of the reaction chamber, and a third stage for chemically changing the mosaic atom layer.
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申请公布号 |
JP2002367982(A) |
申请公布日期 |
2002.12.20 |
申请号 |
JP20020131493 |
申请日期 |
2002.05.07 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
RI SHOKEN;KIM DAE SIK;MIN YO-SEP;CHO YOUNG-JIN |
分类号 |
C23C16/44;C23C16/30;C23C16/34;C23C16/40;C23C16/455;H01L21/316;(IPC1-7):H01L21/316 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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