发明名称 MULTICOMPONENT THIN FILM AND ITS FORMATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a multicomponent thin film and its formation method. SOLUTION: Although a unit substance layer for composing a thin film to be formed on a substrate is formed after the substrate is loaded into a reaction chamber, the unit substance layer is formed through a first stage that is formed by a mosaic atom layer composed of two types of precursors including a substance constituent for at least composing the thin film, a second stage for purging the inside of the reaction chamber, and a third stage for chemically changing the mosaic atom layer.
申请公布号 JP2002367982(A) 申请公布日期 2002.12.20
申请号 JP20020131493 申请日期 2002.05.07
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 RI SHOKEN;KIM DAE SIK;MIN YO-SEP;CHO YOUNG-JIN
分类号 C23C16/44;C23C16/30;C23C16/34;C23C16/40;C23C16/455;H01L21/316;(IPC1-7):H01L21/316 主分类号 C23C16/44
代理机构 代理人
主权项
地址