WAFER EDGE EXPOSURE SYSTEM

摘要

PURPOSE: A system for exposing a wafer edge is provided to effectively exhaust a hot air in the system by controlling rotation rate of a convection fan. CONSTITUTION: The wafer edge exposure system comprises an exhaust line(120) for exhausting a hot air, a convection fan(130) formed at the exhaust line, and a controller(140) for controlling the rotation rate of the convection fan. The system further includes a sensor(142) for sensing the temperature of the system. The controller(140) is controlled the rotation rate of the convection fan(130) in accordance with the temperature checked by the sensor(142).