MASK MANUFACTURING SYSTEM, MASK MANUFACTURING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To rapidly manufacture a high-accuracy mask and semiconductor device at a low cost by making a blank with an optimum film stress. SOLUTION: This system has equivalent pattern calculating means which determines the optimum film stress by previously evaluating the deformation state of the mask by the stress of the film using an equivalent pattern in accordance with mask drawing data, blank making means which makes the blank by forming the film having the optimum film stress obtained in the equivalent pattern calculating means, drawing means which draws an original drawing pattern on the blank while correcting a drawing error in accordance with the predicted result of the deformation state of the bank predicted in the equivalent pattern calculating means, etching means which forms the patterns on the mask by performing etching using the original drawing patterns drawn into drawing means and pattern measuring and inspecting means which inspects the mispositioning after the pattern formation by the etching means.