| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material having low fog, high Dmax(maximum density) and good preservability before and after development. SOLUTION: The heat developable photosensitive material contains photosensitive silver halide, a non-photosensitive organic silver salt, a reducer for silver ions, a binder, a polyhalogenomethylsulfonyl compound of formula (1) (where Z<1> and Z<2> are each halogen; A is H or halogen; R<1> is alkyl or the like) and a compound of formula (2) (where Z<3> is alkyl or the like; W is aryl or the like; and M is a counter cation) on one face of the support.
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