发明名称 |
MANUFACTURING METHOD OF SILICON CARBIDE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for stably manufacturing a high quality bulk single crystal of SiC that has a reduced amount of polymorhs and crystal defects at a practical speed. SOLUTION: In a method in which a SiC single crystal is grown on the substrate surface by contacting the SiC single crystal substrate with a melt containing a Si-containing raw material, a gas containing hydrocarbons is supplied to the melt under an atmospheric or elevated pressure, and the temperature of the contact area of the substrate and the melt is kept lower than that of the melt.
|
申请公布号 |
JP2002356397(A) |
申请公布日期 |
2002.12.13 |
申请号 |
JP20010164061 |
申请日期 |
2001.05.31 |
申请人 |
SUMITOMO METAL IND LTD |
发明人 |
KUSUNOKI KAZUHIKO;TERAO KOICHI |
分类号 |
C30B29/36;H01L21/208;(IPC1-7):C30B29/36 |
主分类号 |
C30B29/36 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|