发明名称 METHOD OF SYNTHESIS OF SILANE
摘要 FIELD: inorganic chemistry, chemical technology. SUBSTANCE: invention relates to technology of preparing semiconductive silicon and to technology of formation of different silicon-containing layers in microelectronics. Process is performed by interaction of silicide with mineral acid. Lithium silicide is used as silicide and interaction is carried out at the room temperature using acetic and hydrochloric acids. EFFECT: increased yield of silane, decreased cost of product. 2 ex
申请公布号 RU2194010(C1) 申请公布日期 2002.12.10
申请号 RU20010109652 申请日期 2001.04.10
申请人 OTKRYTOE AKTSIONERNOE OBSHCHESTVO "NOVOSIBIRSKIJ Z;AVOD KHIMKONTSENTRATOV 发明人 LAVRENT'EV V.I.;ZELENIN JU.M.;LAVRENJUK P.I.;MURATOV E.P.;MUKHIN V.V.;ROZHKOV V.V.;SOKOLOV V.V.;STONOGA JU.A.;TRUSHNIKOVA L.N.
分类号 C01B33/04;(IPC1-7):C01B33/04 主分类号 C01B33/04
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