发明名称 METAL WIRING SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND METAL WIRING SUBSTRATE FOR REFLECTION LIQUID CRYSTAL DISPLAY
摘要 PROBLEM TO BE SOLVED: To provide a metal wiring substrate and a method of manufacturing the same, which can form a pattern of a metal film with a simple process not requiring any etching process on a metal film, can precisely form a fine pattern, even on a metal such as copper (Cu) that is difficult to control etching, and is superior in material utilization efficiency, and a metal wiring substrate for reflection liquid crystal display. SOLUTION: This metal wiring substrate comprises a patterned protective film 2 and a metal film 3, formed selectively at missing parts of the pattern on a resin substrate 1.
申请公布号 JP2002353167(A) 申请公布日期 2002.12.06
申请号 JP20010161066 申请日期 2001.05.29
申请人 SHARP CORP 发明人 CHIKAMA YOSHIMASA;IZUMI YOSHIHIRO
分类号 G02F1/1343;G09F9/30;G09F9/35;H01L21/288;H01L21/3205;H01L21/336;H01L29/786;(IPC1-7):H01L21/288;G02F1/134;H01L21/320 主分类号 G02F1/1343
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