发明名称 |
WASHING BATH HAVING APPARATUS FOR MEASURING HORIZONTAL LEVEL OF SEMICONDUCTOR DEVICE WASHING EQUIPMENT |
摘要 |
PURPOSE: A washing bath having an apparatus for measuring the horizontal level of semiconductor device washing equipment is provided to easily and horizontally install the washing bath in the washing equipment, by occasionally inspecting the horizontal level inspecting apparatus installed in the upper portion of the washing bath. CONSTITUTION: A pad(26a) is installed in parallel with the upper surface of the washing bath(22) containing a small quantity of cleaning solution in the upper portion of the washing bath. A tube(28a) of a dome type is formed in the upper portion of the pad, made of a transparent material and containing a small quantity of aqueous solution. Air bubbles of a predetermined size flow in a divided portion of the tube.
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申请公布号 |
KR20020090495(A) |
申请公布日期 |
2002.12.05 |
申请号 |
KR20010029358 |
申请日期 |
2001.05.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KANG, WON GYU |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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