发明名称 PROCESS CHAMBER LID SERVICE SYSTEM
摘要 Provided herein is a process chamber lid service system comprising a process chamber lid service cart and a process chamber lid service frame. The lid service frame holds the process chamber lid. The cart and the lid service frame are aligned with guide pin (101) and alignement capture (102), meanwhile, the cart is aligned at the process chamber with guide frame (107), which is installed at the base frame of the process chamber. This lid service system may be used for opening/closing a process chamber as well as wet-cleaning the process chamber for semiconductor manufacturing.
申请公布号 WO0227060(A3) 申请公布日期 2002.12.05
申请号 WO2001US29792 申请日期 2001.09.24
申请人 APPLIED MATERIALS, INC. 发明人 KURITA, SHINICHI;BLONIGAN, WENDELL, T.
分类号 C23C16/44;H01L21/687 主分类号 C23C16/44
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