| 摘要 |
PROBLEM TO BE SOLVED: To uniformly hold a temperature distribution in a surface of a wafer 26 and to convey the wafer in a wafer conveying apparatus for conveying the wafer 26. SOLUTION: The wafer conveying apparatus comprises a thermostatic chamber 1 with a temperature regulating function of a temperature control plate 2 for housing the wafer 26 on a moving mechanism 21 which runs on a track 22. The apparatus maintains the temperature of the received wafer 26 with a resist 27, conveys the wafer 26 and holds the temperature distribution in the surface of the wafer 26 uniform without being influenced by an environmental temperature on the way of a conveying route. |
