发明名称 |
Multiple torch - multiple target method and apparatus for plasma outside chemical vapor deposition |
摘要 |
A plurality of glass deposition targets are rotated simultaneously and a first plasma torch, having a coil diameter larger than the sum of the target diameters, deposits glass simultaneously on the plurality. After the diameter of the targets reaches a threshold a second plasma torch is used. The diameter of the second plasma torch can provide for simultaneous deposition. In a further embodiment, after the target diameter reaches a second threshold a third plasma torch is used. In a further embodiment the spacing between the axes of rotation of the targets is widened as the target diameter increases. In a still further embodiment a single plasma torch includes movable concentric tubes within its coil to selectively operate as any of a plurality of different diameter plasma torches.
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申请公布号 |
US2002174690(A1) |
申请公布日期 |
2002.11.28 |
申请号 |
US20010804465 |
申请日期 |
2001.03.13 |
申请人 |
GOUSKOV MIKHAIL I.;DANILOV EVGUENIE B.;ASLAMI MOHD A.;WU DAU |
发明人 |
GOUSKOV MIKHAIL I.;DANILOV EVGUENIE B.;ASLAMI MOHD A.;WU DAU |
分类号 |
C03B37/018;C03B37/014;C03B37/027;(IPC1-7):C03B37/018;C03B37/07 |
主分类号 |
C03B37/018 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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