Process and apparatus for the x-ray diffraction characterization of a material with amorphous phase

摘要

The invention relates to a process for the qualitative and quantitative characterization of a material (2) containing at least one amorphous portions by analysis of X-ray diffraction pattern in which a combined diffraction pattern of the material and of a crystalline <<Standard>> is analyzed with Rietveld method in a computerized device. According to the invention, the combined diffraction pattern (11) is obtained by the linear mathematical combination of a measured diffraction pattern (8) of the crystalline <<Standard>> with a measured diffraction pattern (10) of the material (2) to be analyzed. An apparatus for working the process is also claimed. <IMAGE>