| 摘要 |
The present invention provides an apparatus for liquid phase deposition, comprising: a saturation reaction system, including a mixture trough, at least two supply devices for raw materials, a stirrer device, a filter device, and valve control devices; a steady-flow over-saturation loop reaction system, including an over-saturation reaction trough, at least one liquid level control trough, at least two supply devices for raw materials, a stirrer device, a filter device, and valve control devices; an automatic solution concentration monitoring system, for controlling the reactant concentrations; and a waste liquid recycling system, comprising at least two storage troughs, a recycled waste liquid level sensor, a recycled waste liquid sensor, and valve control devices. The present invention also provides a method for liquid phase deposition, comprising the steps of: providing at least two raw materials from said at least two supply devices of said saturation reaction system into said mixture trough; after stirring by said stirrer device until saturation, filtering out unnecessary solid-state particles by using said filter device; providing saturated and filtered liquid by using said pumps through said valve control devices into said over-saturation reaction trough of said steady-flow over-saturation loop reaction system; stopping providing said saturated and filtered liquid when said over-saturation reaction trough is filled up with said saturated and filtered liquid and said saturated and filtered liquid over-flows into said at least one liquid level control trough to a pre-determined level; switching said valve control devices into a state in which said steady-flow over-saturation loop reaction system runs independently; providing a substrate into said over-saturation reaction trough; providing reactants from said at least two supply devices into said over-saturation reaction trough; and depositing a thin film onto said substrate when said saturated liquid becomes over-saturated. During the reaction, the generated particles can be filtered out by said filter device, and the reaction conditions can be controlled by said recycled waste liquid level sensor and said heater so as to obtain high-quality thin films.
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