发明名称 |
Method of calibration of a lithographic apparatus, mask for use in calibration of lithographic apparatus, lithographic apparatus, device manufacturing method, device manufactured thereby |
摘要 |
An alignment marker for use in calibration of a lithographic projection apparatus has focus sensitive parts and dose sensitive parts, each of which includes an area having a plurality of dots against a contrasting background forming part of a periodic line structure.
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申请公布号 |
US2002172876(A1) |
申请公布日期 |
2002.11.21 |
申请号 |
US20020139625 |
申请日期 |
2002.05.07 |
申请人 |
BASELMANS JOHANNES JACOBUS MATHEUS |
发明人 |
BASELMANS JOHANNES JACOBUS MATHEUS |
分类号 |
G03F7/20;G03F7/207;G03F9/00;H01L21/027;(IPC1-7):G03C5/00;G03B27/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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