发明名称 Method of calibration of a lithographic apparatus, mask for use in calibration of lithographic apparatus, lithographic apparatus, device manufacturing method, device manufactured thereby
摘要 An alignment marker for use in calibration of a lithographic projection apparatus has focus sensitive parts and dose sensitive parts, each of which includes an area having a plurality of dots against a contrasting background forming part of a periodic line structure.
申请公布号 US2002172876(A1) 申请公布日期 2002.11.21
申请号 US20020139625 申请日期 2002.05.07
申请人 BASELMANS JOHANNES JACOBUS MATHEUS 发明人 BASELMANS JOHANNES JACOBUS MATHEUS
分类号 G03F7/20;G03F7/207;G03F9/00;H01L21/027;(IPC1-7):G03C5/00;G03B27/00 主分类号 G03F7/20
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