| 摘要 |
PURPOSE: A rotation type substrate holder of a facing-target sputtering device for fabricating ultra high density magnetic recording disc is provided to fabricate a thin film at a high speed while reducing the damage of the film due to the collision of particles of high energy with a substrate. CONSTITUTION: A rotation type substrate holder of a facing-target sputtering device for fabricating ultra high density magnetic recording disc includes two targets disposed facing to each other and movable vertically for controlling the strength of magnetic fields between the targets, a permanent magnet disposed on rear surfaces of the targets for distributing the magnetic fields perpendicularly to target surfaces, and a substrate holder supporting the substrate and movable to and fro with respect to central parts of the targets for moving the position of the substrate, wherein the targets is applied with negative electric potential and a chamber and the substrate are applied with ground potential, so that rotation motion of γ-electrons is generated and the γ-electrons reciprocate between the targets.
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