| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask which has an auxiliary fixture formed at the periphery of the isolated edge of a feature constituting a pattern so as to correct optical proximity effect. SOLUTION: The mask is used to optically transfer a pattern corresponding to an integrated circuit onto a semiconductor substrate from the mask by using an exposure device and fixtures corresponding to circuit elements constituting the integrated circuit include at least >=1 recessed corner formed of two edges on the mask. Further, the mask includes auxiliary fixtures 21, 26, 29, 30, 32, and 34 for proximity effect correction. The auxiliary fixtures 21, 26, 29, 30, 32, and 34 include two extension parts extending in parallel along the edges constituting the recessed corner among recessed corners at a specific distance from the two edges, and two extension parts are connected to each other by being bent at the same angle corresponding to the recessed corner to constitute the auxiliary fixtures 32 and 34 for proximity effect correction in polygonal structure having specific width. |
