| 摘要 |
A support assembly (12) for an exposure apparatus (10) includes a frame assembly (34), an elevator assembly (36) and a pivot assembly (38) for supporting at least one subassembly above an isolation base (32). The elevator assembly (36) selectively lifts the frame assembly (34) and the subassembly relative to the isolation base (32). Further, the pivot assembly (38) allows a portion of the frame assembly (34) and the subassembly to be rotated relative to the isolation base (32). As a result of this design, the subassemblies of the exposure apparatus (10) can be removed relatively easily for service and adjustment.
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