| 摘要 |
A lithographic projection apparatus comprising a first radiation system (1) for providing a first projection beam of radiation (4), a second radiation system (11) for providing a second projection beam of radiation (14), a support structure for supporting a first patterning means (2) and a second patterning means (12), the first patterning means serving to pattern the first projection beam according to a first pattern and the second patterning means serving to pattern the second projection beam according to a first pattern; a substrate table for holding a substrate (25), a projection system (20) for combining the first (24) and second (224) patterned beams and projecting the combined beam (2224) onto a target portion of the substrate. <IMAGE> |
