| 摘要 |
PURPOSE: A CVD(Chemical Vapor Deposition) system is provided to easily and automatically remove particles existing in a wafer intake and a vacuum intake without disassembling and reassembling by installing an inert gas supply part in the vacuum intake. CONSTITUTION: The CVD system(11) comprises a wafer holder(5) having a plurality of vacuum holes(150), a chamber(10), a gas inlet(13), a wafer intake(101) including a tube(140), a filter(130) and a valve(120), and a vacuum intake(201) including a tube(240), a filter(230) and a valve(220). The wafer intake(101) further includes an inert gas supply part(160) connected to the tube(140) between the filter(130) and the valve(120), a subsidiary tube(141), and a subsidiary valve(121). Also, the vacuum intake(201) further includes an inert gas supply part(260), a subsidiary tube(241) and a subsidiary valve(221).
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