发明名称 METHOD FOR PRODUCING A SIO2 BLANK
摘要 According to a known method for producing a SiO2 blank, SiO2 particles are formed in a plurality of deposition burners arranged in series, a burner flame being associated to each burner, and said particles are then deposited on a deposition surface of a carrier rotating about its longitudinal axis. The series of deposition burners moves back and forth according to a pre-determined displacement sequence along the blank being formed, and between inflection points at which the displacement direction is reversed. The burner flame forms a projection surface in a projection on a plane parallel to its main propagation direction, the lateral boundary lines of said projection surface forming an opening angle with the mean propagation direction. In order to provide a simple method for producing a porous blank, based on the above, and by which means a homogeneous quartz glass body is obtained, the opening angle ( alpha ) is set to a value of between 3 DEG and 15 DEG and the distance (D) between the deposition burner (2) and the deposition surface (10) is set between 170 mm and 240 mm.
申请公布号 WO02057193(A3) 申请公布日期 2002.10.31
申请号 WO2002EP00478 申请日期 2002.01.18
申请人 HERAEUS TENEVO AG;PEPER, UDO;ROEPER, JUERGEN;FRITSCHE, HANS-GEORG 发明人 PEPER, UDO;ROEPER, JUERGEN;FRITSCHE, HANS-GEORG
分类号 C03B19/14;C03B37/014 主分类号 C03B19/14
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