| 摘要 |
PURPOSE: A light source for aligning a wafer in exposure equipment for fabricating a semiconductor device is provided to reduce a cost for performing an auto global alignment process by using a high temperature mercury lamp instead of a halogen lamp. CONSTITUTION: A high temperature mercury lamp(40) generates light for an exposure process. An interference filter(42) is connected with the high temperature mercury lamp(40) by an optical fiber(41). The interference filter(42) is used for converting the light received from the optical fiber(41) to light for illumination. A reticle(54) has a pattern printed on a wafer. The first and the second scopes(44,46) are used for receiving the light from the interference filter(42) and converting the received light to wafer alignment light. The first and the second reflective mirrors(52,54) are used for reflecting the light of the first and the second scopes(44,46) to an alignment mark of the wafer(62) through a projection lens(58), and transmitting the light reflected from the alignment mark to the first and the second scopes(44,46). The third scope(56) is used for receiving a light source from the high temperature mercury lamp(40) and aligning the reticle(54).
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