发明名称 Production method of electronic parts and water treatment apparatus
摘要 A production method of an electronic part comprising a step o working a substrate having formed thereon a metal thin-film conductor using water, wherein said water satisfies the relations 3.5<=pH<=6.5 and DO<=0.5 pH2-6.5 pH+22 [wherein DO represents a dissolved oxygen amount (unit ppm)].By using the water in the case of working substrates in the production steps of electronic parts, the generations of the static electricity and the oxidation caused by water used for working are restrained. The present invention is particularly effective in working of an electronic part wherein a metal thin-film conductor containing at least two kinds of metals including Al on a substrate having a pyroelectric property.
申请公布号 US6471783(B1) 申请公布日期 2002.10.29
申请号 US19990314117 申请日期 1999.05.19
申请人 TDK CORPORATION 发明人 GOTOH MASASHI;KANAZAWA JITSUO;YAMAMOTO SYUICHIRO
分类号 B08B3/10;B01D19/00;C01B5/00;C02F1/20;C02F1/58;H01L21/301;H01L21/304;H01L37/02;H01L41/09;H01L41/22;H03H3/08;(IPC1-7):B08B3/04 主分类号 B08B3/10
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