发明名称 Method of manufacturing a nitride series III-V group compound semiconductor
摘要 When nitride series III-V group compound semiconductor is manufactured by gas phase growing using starting material for a group III element, ammonia as a starting material for a group V element and hydrogen, the gas phase molar ratio of hydrogen to the total amount of hydrogen and ammonia (H2/(H2+NH3)) is specified to 0.3<(H2/(H2+NH3))<0.7, 0.3<(H2/(H2+NH3))<0.6 or 0.4<(H2/(H2+NH3))<0.5. A nitride series III-V group compound semiconductor can thus be manufactured with less non-emission center and of excellent crystallinity.
申请公布号 US6471769(B2) 申请公布日期 2002.10.29
申请号 US19990365903 申请日期 1999.08.03
申请人 SONY CORPORATION 发明人 HASHIMOTO SHIGEKI;YANASHIMA KATSUNORI;ASATSUMA TSUNENORI;IKEDA MASAO
分类号 C30B25/02;H01L21/205;H01L33/32;H01S5/00;H01S5/323;(IPC1-7):C30B25/14 主分类号 C30B25/02
代理机构 代理人
主权项
地址