发明名称 |
Method of manufacturing a nitride series III-V group compound semiconductor |
摘要 |
When nitride series III-V group compound semiconductor is manufactured by gas phase growing using starting material for a group III element, ammonia as a starting material for a group V element and hydrogen, the gas phase molar ratio of hydrogen to the total amount of hydrogen and ammonia (H2/(H2+NH3)) is specified to 0.3<(H2/(H2+NH3))<0.7, 0.3<(H2/(H2+NH3))<0.6 or 0.4<(H2/(H2+NH3))<0.5. A nitride series III-V group compound semiconductor can thus be manufactured with less non-emission center and of excellent crystallinity.
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申请公布号 |
US6471769(B2) |
申请公布日期 |
2002.10.29 |
申请号 |
US19990365903 |
申请日期 |
1999.08.03 |
申请人 |
SONY CORPORATION |
发明人 |
HASHIMOTO SHIGEKI;YANASHIMA KATSUNORI;ASATSUMA TSUNENORI;IKEDA MASAO |
分类号 |
C30B25/02;H01L21/205;H01L33/32;H01S5/00;H01S5/323;(IPC1-7):C30B25/14 |
主分类号 |
C30B25/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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