| 发明名称 |
METHOD FOR FORMING SILICA |
| 摘要 |
microelectronics, namely processes for making integrated microcircuits. SUBSTANCE: method comprises steps of making silica by forming it at reduced pressure while adding chlorine-containing matter enhancing electrophysical parameters of silica. EFFECT: improved properties of silica. 6 cl |
| 申请公布号 |
RU2191848(C2) |
申请公布日期 |
2002.10.27 |
| 申请号 |
RU19990126689 |
申请日期 |
1999.12.16 |
| 申请人 |
AKTSIONERNOE OBSHCHESTVO OTKRYTOGO TIPA "NII MOLEK |
发明人 |
KRASNIKOV G.JA.;MANZHA N.M.;NECHIPORENKO A.P.;BURZIN S.B. |
| 分类号 |
C23C16/40;C23C16/24;H01L21/365 |
主分类号 |
C23C16/40 |
| 代理机构 |
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代理人 |
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