发明名称 POLYCRYSTALLINE SEMICONDUCTOR THIN FILM AND MANUFACTURING METHOD THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To provide a polycrystalline semiconductor thin film which has high ON-characteristics with little characteristics variation and high mobility. SOLUTION: Crystallization starts from a plurality of crystal nuclei A, C, D, E, F introduced in an amorphous silicon film in their respective linear directions to grow a plurality of columnar crystals CS approximately oriented in panes. A rod-like domain RC composed of a plurality of columnar crystals CS continues growing while bending or branching and collides against another rod-like domain RC grown from other crystal nucleus, thus completing the growth. Between adjacent rod-like domains RC, a region having substantially the same crystal orientation is formed through which electrons or holes pass to move between both domains RC.</p>
申请公布号 JP2002313720(A) 申请公布日期 2002.10.25
申请号 JP20010120340 申请日期 2001.04.18
申请人 SHARP CORP 发明人 MORIGUCHI MASAO;MAKITA NAOKI
分类号 G02F1/1368;H01L21/20;H01L21/265;H01L21/28;H01L21/336;H01L21/768;H01L29/786;(IPC1-7):H01L21/20;G02F1/136 主分类号 G02F1/1368
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