发明名称 MANUFACTURING METHOD OF APERTURE GRILL
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method, by which an aperture grill, having high accuracy and fineness, which will not produce halation at the end part of an image surface, can be manufactured by plating method, with high yield and at a low cost. SOLUTION: A slit-shaped resist pattern group is formed by arranging a light source of linear scattered light, directly above the center of a conductor plate surface, in parallel with the direction of slits, and adjusting the distance between the light source of linear scattered light and the conductive plate surface, and exposing the scattered light on a resist layer. For the aperture grill formed by plating method, using the slit-shaped resist pattern group, the shape of cross section of a tape part 1a, in a direction perpendicular to the direction of the slits, is almost rectangular at the center part, and almost shaped in a parallelogram with an acute angle part slanted toward the center at both end parts, and the angel of the acute angle part gets smaller as it is headed to both end parts, and angelθof the acute angel part at both endmost part becomes 70 deg.-50 deg..
申请公布号 JP2002313228(A) 申请公布日期 2002.10.25
申请号 JP20010115225 申请日期 2001.04.13
申请人 SUMITOMO METAL MINING CO LTD 发明人 SAKURADA TAKEHIKO
分类号 C25D1/08;H01J9/14;H01J29/07;(IPC1-7):H01J9/14 主分类号 C25D1/08
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