SUBSTRATE SUPPORT MEMBER, SUBSTRATE RETENTION MECHANISM USING THE SAME, SUBSTRATE CONVEYANCE APPARATUS AND METHOD THEREFOR, AND SUBSTRATE TREATMENT APPARATUS AND METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a substrate support member that can prevent contamination in a substrate and at the same time can stably retain the substrate, a substrate retention mechanism using the substrate support member, substrate conveyance apparatus and method therefor, and substrate treatment apparatus and method therefor. SOLUTION: A hand for retaining a wafer is provided in a conveyance robot for conveying the wafer. On the upper surface of the hand, wafer support members 81 to 84 and 91 to 94 are fixed. The wafer support members 81 to 84 and 91 to 94 have a wafer contact section 860 that comes into contact with the circumference section of the wafer from a lower section, and a taper surface 865 that rises from the wafer contact section 860 to a slanting upper section and controls the horizontal movement of the wafer. The wafer contact section 860 is formed at a ridge section 863 where a pair of inclines 861 and 862 meets. The ridge section 863 inclines downward as the section 863 goes toward the inside of the wafer, and is subjected to point contact at the circumference section of the wafer.